SEMICON Korea 2018
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Laser Annealer LT-3100
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
Ultra-low thermal budget. High-temperature melt-annealing of wafer surfaces in sub-micro seconds.
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Flash Lamp Annealer LA-3100
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
Contributes Significantly to Imparoving the Characteristics of State-of the Art Devices
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Coat/Develop Track DT-3000
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
High Productivity, > 450 wph Capable Dual Track System
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Wet Station FC-3100
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
Next-generation versatility, speed and functionality.
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Single Wafer Cleaner SU-3200
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
Expandable up to 12 chambers. Impressively high throughput of up to 800 wafers per hour.
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Single Wafer Cleaning System SU-3300
SCREEN Semiconductor Solutions Co., Ltd.
(
Booth
D430
)
Seventh generation system inherits SCREEN's single wafer cleaning DNA
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