SEMICON Europa 2016

Sessions Speakers Exhibitors Products Press Releases Floor Plan

EМ-5189-xx Multi-beam Laser Pattern Generator

The EM-5189-xx tool is used for making metallized photomasks and wafers in the production process of LSIs, VLSIs and other electronic devices. Patterns are written aligned with previous layers' patterns. Mask/wafer mode time is just 5 minutes.