Garching, May 4, 2016 – SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, today announces the extension of its technology range by leading-edge laser surface imaging. This technology has been developed through an external partner in Europe and the first SUSS product will be launched in Q2 2016.
This process is well-suited not only for resist structuring, but also for lithography mask production, micro-ablation, and high-resolution metrology. The highly flexible technology is suitable for the various requirements of academic and industrial R&D laboratories. Its main fields of application include submicron- and 3D structuring, microfluidics, mask manufacturing and the definition of micro-optical components.
“With laser surface imaging, we aim to strengthen our leadership position in the lithography segment, in particular in the attractive MEMS market.” says Dr. Per-Ove Hansson, CEO of SUSS MicroTec. “By initially targeting the R&D market, we expect order intake and sales to be in the low million Euro range for the time being. Longer term we aim to develop this technology further in order to address higher volume manufacturing applications as well.”