KOBUS has developped a unique deposition method at the crossroads of ALD and CVD: F.A.S.T. for Fast Atomic Sequential Technology.
Based on proprietary CVD reactor design combined with pulsed capability, it is optimal for thick and conformal layer and offers solution for 3D integration challenges.
KOBUS
ALD film performances at CVD speed
Product Categories
205 Nanotechnology Equipment and Tools
- Equipment, Nanotechnology Tools
207 Process Equipment
- Deposition; Chemical Vapor (CVD); MOCVD; PECVD; LPCVD; ALD; REALD; MVD