The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers’ device performance and yield. The systems’ common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis’ industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance. The platform’s proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today. The platform’s superior beam current performance combined with the Purion™ 500wph end station provides the industry’s highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE™ and Purion VXE™ high energy implanters.
Product Categories
207 Equipment, Process
- Ion Implantation Equipment
308 Materials, Substrate
- Silicon on Insulator (SOI); Silicon on Sapphire (SOS); Silicon Carbide;