Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition systems.
RTP systems with cold wall chamber, high temperature lamp furnaces (1450°C) and high vacuum capability from 3-inch to 200 mm for RTP and RTCVD processes. Applications: rapid thermal annealing, RTO, RTN, contact annealing, CVD of graphene, CNT, selenization, ...
High temperature RTP furnace up to 2000°C for silicon carbide implant annealing and graphene applications.
DLI-CVD / DLI-ALD systems with direct liquid injection (DLI) vaporizers for deposition of metals, oxides and nitrides. These systems have multi process capabilities inside the same process chamber: CVD, ALD, MOCVD and pulse pressure CVD. The 2-inch system includes in-situ annealing capability and is a unique machine on the market allowing pre-deposition annealing, deposition in CVD and ALD mode and post deposition Annealsys.
Other systems: LPCVD and spray-CVD system
Web site: www.annealsys.com
Product Categories
202 Other Equipment
- Heating; Annealing; Curing Equipment - Furnaces; Conveyors; Ovens; Test Chambers; Heat Treating
205 Nanotechnology Equipment and Tools
- Equipment, Nanotechnology Tools
206 PV Equipment
- Thin Film
207 Process Equipment
- Deposition; Chemical Vapor (CVD); MOCVD; PECVD; LPCVD; ALD; REALD; MVD
- Thermal Processing - Diffusion; Oxidation; Annealing; RTA; RTP Equipment