General Plasma is a leader in advanced sources for large area vacuum thin film coating. Our patented and patent pending sources include high efficiency rotary and planar magnetrons, high performance linear ion sources, and innovative Linear PECVDTM technology.
GPI’s line of magnetron cathodes includes maintenance free rotary magnetron end blocks, 80% target utilization magnet bars, and 60% target utilization moving magnet planar magnetrons. These products offer the lowest operational cost available in the industry.
Additionally, General Plasma has invented a Linear PECVDTM source technology. This technology is enabling a paradigm shift in the deposition of metal oxides and nitrides on large area substrates for the solar, display, and glass industries.
GPI offers complete, turn-key Linear PECVDTM solutions including the deposition source modules, process recipes, gas delivery systems, and integration into your control system. Look to General Plasma to see the future of thin film coating!
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