Over 35 years of vacuum system and component design, manufacture, and support. Manufacturer of eVap electron beam source, US Gun II and MAK magnetron sputter sources, high-temperature substrate heaters, and Vari-Q throttle valves.
eVap Electron Beam Sources
- Complete line of single & multiple pocket configurations
- 2cc to 400cc pocket volume
- Complete flange mount assemblies with feedthroughs and shutter
- Progammable XY sweep controllers
- 3kW to 15kW power supply options
- Deposition controllers
- Crucible liners and accessories
MAK Planar Magnetron Sputter Sources
- 1.3”, 2”, 3”, 4”, 6”
- DC/RF compatible
- Insitu adjustable angle of incident or source to substrate distance
- Right angle, linear and flex mount
- Custom Multi-source packages
- Optional shutter, gas injection, flange, and UHV selection
- DC & RF power supplies/matching networks
HTR Substrate Heaters
- Wafer or sample holders
- 2”,3”,4”, and 6” diameter
- 950 C °
VQ Throttle Valves
- Vari-Q multi-vane, high resolution Throttle Valves
- Upstream or Downstream pressure control, compatible with most pressure control systems.
- Elastomer or metal sealed flanges, from 100mm to 38”, ANSI, ISO, JIS, CF
- Optimized open gas throughput, linear high resolution pressure control.
Product Categories
Power Supplies
- DC
- Electron beam
- RF
Process Monitoring and Control
- Deposition rate monitors/controllers
Vacuum Components
- Heating stages
- Valves
Vacuum/Plasma Systems
- Evaporation
Vaporization Sources
- Electron beam evaporation
- Sputtering
- Thermal evaporation, resistive