GENCOA - www.gencoa.com
Gencoa provide leading edge components and solutions for thin film and sputtering industry. The company's key focus is on providing integrated solutions to improve layer properties and production speeds by supplying state-of-the-art magnetron cathodes, process controllers and plasma pre-treaters. Gencoa also specialize in providing process training, support and implementation on-site at the customers' factory.
For the thin film industry, Gencoa manufacture the following products:
- High yield rectangular planar magnetrons 100, 125, 150, 200, 250 & 300mm wide targets with >40% target use guaranteed for metallic processes.
- High yield circular planar magnetrons with target dia.from 2"(50mm) upto 24"(600mm) with >50% target use and good uniformity.
- Rotatable magnetrons with a variety of end blocks for cantilever or drop-in mounting styles and a new GRS small diamater target format.
- A large range of rotatable magnetron magnetic arrays for metal layers, double cathode high rate reactive oxide layers, single and double cathode TCO low resistivity layers.
- Speedflo reactive gas process controllers for high rate oxide layers and precise composition balancing.
- Speedflo condition monitoring system for layer quality measurement and feedback control for thermal evaporation systems.
- Linear ion sources for plasma pre-cleaning of polymeric substrates.
- Plasma etchers for plasma pre-cleaning of metallic substrates.
- Effusion cell for Se and S material deposition (eg CIGS) and Monomer deposition (eg OLED).
Gencoa are not only suppliers of key components, but also a process development partner with a proven record of delivering optimum solutions in the solar, semiconductor and display sectors – as our many satisfied customers will testify.
Product Categories
Coatings/treatments for specific applications/properties
- Flexible electronics
- Optical, AR
- Transparent conductive oxides
Coatings/treatments for specific markets
- Display technology
- Transparent conductive oxides
Deposition Rate Monitoring/Control
- Optical emission spectroscopy
Ion/Plasma Sources
- Ion beam
Process Monitoring and Control
- Gas and gas mixtures
- Optical emission spectroscopy
Vaporization Sources
- Sputtering