2019 SVC TechCon
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Anna W.
Oniszczuk
Anna W. Oniszczuk
TRUMPF Huettinger Sp. z o.o.
Sessions :
Effect of HIPIMS Pulse Mode and Pulse Parameters on a Reactive SiOx Deposition Process
Application of Design of Experiment Methods for Effective Process Probing and Parameters Optimization in Industrial Coating Deposition
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