SVC TechCon 2017
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Ralf
Bandorf
Ralf Bandorf
Fraunhofer IST
Sessions :
Controlling the ion to neutral ratio by measuring the plasma emission in a non-reactive HIPIMS process
Process transfer from R&D to small industrial cathode
Advanced HIPIMS solution for R&D and Process Development
Micro-structure investigations on gas flow sputtered thermal barrier coatings
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