SEMICON Europa 2016

Christoph Hossbach
Senior Scientist
Technische Universität Dresden, Institute of Semiconductors and Microsystems


Christoph Hossbach obtained the M.Sc. degree in Electrical Engineering in 2005 and the Ph.D. degree in Electrical Engineering in 2013. He is currently a Senior Scientist at the Institute of Semiconductors and Microsystems of Technische Universität Dresden, Germany. His fields of expertise include Atomic Layer Deposition (ALD), Plasma Enhanced ALD, Molecular Layer Deposition (MLD), Chemical Vapor Deposition (CVD), Plasma Enhanced CVD, process, film and growth characterization with in situ and ex situ metrology, as well as tool and component design. Dr. Hossbach is co-founder and university representative of science network ALD Lab Saxony. He is author or co-author in more than 30 publications and involved in organization of workshops, teaching and consulting.

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