High-Rate PECVD Based on a Hollow Cathode Arc Discharge
(Room Room 104-A)
29 Apr 19
11:40 AM
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12:00 PM
Tracks:
WebTech Roll-to-Roll Coatings for High-End Applications
Plasma Enhanced Chemical Vapor Deposition (PECVD) is widely used for the deposition of SiO2-like and organically modified SiO2-like coatings. This presentation discusses recent results on the deposition of organically modified SiO2-like coatings by using a hollow cathode arc discharge for PECVD. The hollow cathode plasma exhibits high electron densities that allow ultra-high deposition rates up to 3000 nm*(m/min). However, these high deposition speeds usually lead to porous and columnar coating structures. It is therefore a major challenge to balance deposition rate, coating uniformity and required layer properties. All experiments in this study were done using the monomer Hexamethyldisiloxane (HMDSO) and reactive gas oxygen. The deposition rate is mainly determined by the HMDSO flow. The chemical composition and microstructural evolution of these coatings are investigated at different deposition rates. It is shown that coatings with similar optical properties and topological properties can be deposited for a wide range of deposition speeds from 200 to 700 nm·(m/min) provided that the right deposition parameters are chosen. The last part presents new results on the improved cross-web coating uniformity of the coatings.