Uniform and Efficient Composite Nanostructures Coating Via Atomic Layer Deposition: From Nanoparticles to Large Area Flexible Display Applications
(Room Room 104-B)
30 Apr 19
9:20 AM
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9:40 AM
Tracks:
Heuréka! Post-Deadline Recent Developments
Atomic layer deposition (ALD) is an attractive approach for atomically controllable and conformal coatings on nanoparticles to large scale substrates for the fields of catalysts, optical detections, displays, etc. The precise surface modification and coating of composite nanostructured materials on a confined space of few nanometers is very challenging. Meanwhile, for practical applications, fabrication strategy is needed to combine the nanoscale synthesis accuracy and the efficiency mass production when scale up. In this talk, we will discuss ALD based coating approaches from nanoparticles to macroscopic high efficient instrument and fabrication process design. First, in the nanoscale aspect, nanoparticles ALD coating methods are developed with a rotation fluidization coupled reactor. Such process allows the fluidization to facilitate the precursor transport in the particle bed and intensify the dynamic breaking up of the particle agglomerates to expose particle surfaces to precursors. Then, the spatial separated ALD method and instrument are developed to increase the production efficiency. To demonstrate the ability of ALD method, we will use quantum dots (QDs) based display as an example, the fabrication process includes QDs monomers’ surface passivation, and flexible display devices encapsulation. It shows that the ALD approaches are versatile and powerful for enhancement of flexible displays’ performance and stability.