HIPIMS- Kick Pulse Advantages
(Room Room 104-A)
30 Apr 19
10:40 AM
-
11:00 AM
Tracks:
High Power Impulse Magnetron Sputtering – HIPIMS
HIPIMS is an ionized PVC technique that produces a high density, high performance films. The extreme power densities in HIPIMS create a higher ionized plasma that creates a very high energy of material being deposited onto the substrate.
Many advanced techniques have been found to further enhance the quality of HIPIMS films, creating more ideal process and applications for utilizing this technique.
We will show advantages of integrating a positive “kick” pulse into a HIPIMS application. The “kick” pulse is an ideal feature for reactive sputtering applications due to its ability to carry out the HIPIMS plasma for an extended period of time, minimizing the disapperating anode effect and repelling metal ions from the plasma toward the substrate resulting in higher sputtering rates.