Harlan™: High Rate-High Density Pulsed Magnetron Sputtering Source for Depositing Metal and Ceramic Coatings for Industrial Applications.
(Room Promenade Lobby)
01 May 19
1:40 PM
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1:50 PM
Tracks:
Vendor Innovator Showcase
A patented & proprietary deposition source developed in-house from the ground up. The development includes a newly designed high-density plasma generator and an improved magnetron deposition source far more superior to any conventional magnetron technology in the market today. The result is a game changing performance which can be configurable, scalable and tunable to any desired process such as DLC (ta-C, Me-DLC and a:C-H), High Rate Metal Nitrides (MeN) and High Rate Metal Oxide (MeO), Highly Ionized Metal (Me).