Deposition Control Using Optical and Physical Monitoring Methods
(Room Wabash 1)
12 May 16
11:00 AM
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11:20 AM
Optical monitoring and crystal rate monitoring have long been used to control optical coatings during the deposition process. Rarely have they been used in concert to produce films to achieve more reliable results than when used individually. This paper will begin with a discussion of the history and technology of both methods and then move on to discuss the properties of both methods of deposition control. It will provide an evaluation of the strengths and weakness of each and present a concept of using both intimately integrated to achieve superior deposition control.